Semiconductor processing chamber for multiple precursor flow

ABSTRACT

Exemplary semiconductor processing systems may include a processing chamber, and may include a remote plasma unit coupled with the processing chamber. Exemplary systems may also include an adapter coupled with the remote plasma unit. The adapter may include a first end and a second end opposite the first end. The adapter may define a central channel through the adapter. The adapter may define an exit from a second channel at the second end, and the adapter may define an exit from a third channel at the second end. The central channel, the second channel, and the third channel may each be fluidly isolated from one another within the adapter.

TECHNICAL FIELD

The present technology relates to semiconductor systems, processes, and equipment.

More specifically, the present technology relates to systems and methods for delivering precursors within a system and chamber.

BACKGROUND

Integrated circuits are made possible by processes which produce intricately patterned material layers on substrate surfaces. Producing patterned material on a substrate requires controlled methods for removal of exposed material. Chemical etching is used for a variety of purposes including transferring a pattern in photoresist into underlying layers, thinning layers, or thinning lateral dimensions of features already present on the surface. Often it is desirable to have an etch process that etches one material faster than another facilitating, for example, a pattern transfer process or individual material removal. Such an etch process is said to be selective to the first material. As a result of the diversity of materials, circuits, and processes, etch processes have been developed with a selectivity towards a variety of materials.

Etch processes may be termed wet or dry based on the materials used in the process. A wet HF etch preferentially removes silicon oxide over other dielectrics and materials. However, wet processes may have difficulty penetrating some constrained trenches and also may sometimes deform the remaining material. Dry etch processes may penetrate into intricate features and trenches, but may not provide acceptable top-to-bottom profiles. As device sizes continue to shrink in next-generation devices, the ways in which systems deliver precursors into and through a chamber may have an increasing impact. As uniformity of processing conditions continues to increase in importance, chamber designs and system set-ups may have an important role in the quality of devices produced.

Thus, there is a need for improved systems and methods that can be used to produce high quality devices and structures. These and other needs are addressed by the present technology.

SUMMARY

Exemplary semiconductor processing systems may include a processing chamber, and may include a remote plasma unit coupled with the processing chamber. Exemplary systems may also include an adapter coupled with the remote plasma unit. The adapter may include a first end and a second end opposite the first end. The adapter may define a central channel through the adapter. The adapter may define an exit from a second channel at the second end, and the adapter may define an exit from a third channel at the second end. The central channel, the second channel, and the third channel may each be fluidly isolated from one another within the adapter.

In some embodiments, the second channel may include a first annular channel extending at least partially through a vertical cross-section of the adapter, and the second channel may be defined about the central channel. The adapter may also define a first port located at an exterior of the adapter, and the first port may be configured to provide fluid access to the second channel. The third channel may include a second annular channel extending at least partially through a vertical cross-section of the adapter, and the third channel may be defined about the second channel. The adapter may also define a second port located at an exterior of the adapter, and the second port may be configured to provide fluid access to the third channel. In some embodiments, the central channel, the second channel, and the third channel may be concentrically aligned. The systems may also include an isolator coupled between the adapter and the remote plasma unit. In embodiments, the isolator may be or include a ceramic. The systems may also include a mixing manifold coupled between the adapter and the processing chamber. The mixing manifold may be characterized by an inlet having a diameter greater than or equal to an external diameter of the third channel. The inlet of the mixing manifold may transition to a tapered section of the mixing manifold. Additionally, the tapered section of the mixing manifold may transition to a flared section of the mixing manifold extending to an outlet of the mixing manifold.

The present technology also encompasses semiconductor processing systems, which may include a remote plasma unit. The systems may also include a processing chamber. The processing chamber may include a gasbox defining a central channel. The processing chamber may also include a blocker plate coupled with the gasbox. The blocker plate may define a plurality of apertures through the blocker plate. The processing chamber may also include a faceplate coupled with the blocker plate at a first surface of the faceplate. The processing chamber may also include an ion suppression element coupled with the faceplate at a second surface of the faceplate opposite the first surface of the faceplate.

In some embodiments, the systems may further include a heater coupled externally to the gasbox about a mixing manifold coupled to the gasbox. The gasbox may define a first volume from above and the blocker plate may define the first volume along an external diameter of the first volume and from below. Additionally, the faceplate may define a second volume from above and along an external diameter of the second volume, and the ion suppression element may define the second volume from below. The gasbox, blocker plate, faceplate, and ion suppression element may be directly coupled together. The systems may also include an adapter coupled with the remote plasma unit, where the adapter may include a first end and a second end opposite the first end. The adapter may define a central channel through the adapter, and the adapter may define an exit from a second channel at the second end. The adapter may define an exit from a third channel at the second end of the adapter, and in some embodiments the central channel, the second channel, and the third channel may be each fluidly isolated from one another within the adapter. In some embodiments, the ion suppression element may be configured to limit or reduce ionic species delivered to a processing region of the processing chamber.

The present technology also encompasses methods of delivering precursors through a semiconductor processing system. The methods may include forming a plasma of a fluorine-containing precursor in a remote plasma unit. The methods may include flowing plasma effluents of the fluorine-containing precursor into an adapter. The methods may include flowing a hydrogen-containing precursor into the adapter. The methods may also include flowing a third precursor into the adapter. The adapter may be configured to maintain the plasma effluents of the fluorine-containing precursor, the hydrogen-containing precursor, and the third precursor fluidly isolated through the adapter. The methods may also include flowing the plasma effluents of the fluorine-containing precursor and the hydrogen-containing precursor into a mixing manifold configured to mix the plasma effluents of the fluorine-containing precursor and the hydrogen-containing precursor. In some embodiments, the methods may further include flowing the mixed plasma effluents of the fluorine-containing precursor, the hydrogen-containing precursor, and the third precursor into a processing chamber.

Such technology may provide numerous benefits over conventional systems and techniques. For example, by having multiple bypass pathways, multiple precursors may be delivered while protecting chamber component degradation. Additionally, by utilizing components that produce etchant species outside of the chamber, mixing and delivery to a substrate may be provided more uniformly over traditional systems. These and other embodiments, along with many of their advantages and features, are described in more detail in conjunction with the below description and attached figures.

BRIEF DESCRIPTION OF THE DRAWINGS

A further understanding of the nature and advantages of the disclosed technology may be realized by reference to the remaining portions of the specification and the drawings.

FIG. 1 shows a top plan view of an exemplary processing system according to embodiments of the present technology.

FIG. 2A shows a schematic cross-sectional view of an exemplary processing chamber according to embodiments of the present technology.

FIG. 2B shows a detailed view of an exemplary showerhead according to embodiments of the present technology.

FIG. 3 shows a bottom plan view of an exemplary showerhead according to embodiments of the present technology.

FIG. 4 shows a schematic cross-sectional view of an exemplary processing system according to embodiments of the present technology.

FIG. 5 illustrates a schematic bottom partial plan view of an inlet adapter according to embodiments of the present technology.

FIG. 6 shows operations of a method of delivering precursors through a processing chamber according to embodiments of the present technology.

Several of the figures are included as schematics. It is to be understood that the figures are for illustrative purposes, and are not to be considered of scale unless specifically stated to be of scale. Additionally, as schematics, the figures are provided to aid comprehension and may not include all aspects or information compared to realistic representations, and may include exaggerated material for illustrative purposes.

In the appended figures, similar components and/or features may have the same reference label. Further, various components of the same type may be distinguished by following the reference label by a letter that distinguishes among the similar components. If only the first reference label is used in the specification, the description is applicable to any one of the similar components having the same first reference label irrespective of the letter.

DETAILED DESCRIPTION

The present technology includes semiconductor processing systems, chambers, and components for performing semiconductor fabrication operations. Many dry etch operations performed during semiconductor fabrication may involve multiple precursors. When energized and combined in various ways, these etchants may be delivered to a substrate to remove or modify aspects of a substrate. Traditional processing systems may provide precursors, such as for etching, in multiple ways. One way of providing enhanced precursors or etchants is to provide all of the precursors through a remote plasma unit before delivering the precursors through a processing chamber and to a substrate, such as a wafer, for processing. An issue with this process, however, is that the different precursors may be reactive with different materials, which may cause damage to the remote plasma unit. For example, an enhanced fluorine-containing precursor may react with aluminum surfaces, but may not react with oxide surfaces. An enhanced hydrogen-containing precursor may not react with an aluminum surface within a remote plasma unit, but may react with and remove an oxide coating. Thus, if the two precursors are delivered through a remote plasma unit together, they may damage a coating or liner within the unit.

Traditional processing may also deliver one precursor through a remote plasma device for plasma processing, and may deliver a second precursor directly into a chamber. An issue with this process, however, is that mixing of the precursors may be difficult, may not provide adequate control over etchant generation, and may not provide a uniform etchant at the wafer or substrate. This may cause processes to not be performed uniformly across a surface of a substrate, which may cause device issues as patterning and formation continues.

The present technology may overcome these issues by utilizing components and systems configured to mix the precursors prior to delivering them into the chamber, while only having one etchant precursor delivered through a remote plasma unit, although multiple precursors can also be flowed through a remote plasma unit, such as carrier gases or other etchant precursors. The particular bypass scheme may fully mix the precursors prior to delivering them to a processing chamber. This may allow uniform processes to be performed while protecting a remote plasma unit. Chambers of the present technology may also include component configurations that maximize thermal conductivity through the chamber, and increase ease of servicing by coupling the components in specific ways.

Although the remaining disclosure will routinely identify specific etching processes utilizing the disclosed technology, it will be readily understood that the systems and methods are equally applicable to deposition and cleaning processes as may occur in the described chambers. Accordingly, the technology should not be considered to be so limited as for use with etching processes alone. The disclosure will discuss one possible system and chamber that can be used with the present technology to perform certain of the removal operations before additional variations and adjustments to this system according to embodiments of the present technology are described.

FIG. 1 shows a top plan view of one embodiment of a processing system 100 of deposition, etching, baking, and curing chambers according to embodiments. In the figure, a pair of front opening unified pods (FOUPs) 102 supply substrates of a variety of sizes that are received by robotic arms 104 and placed into a low pressure holding area 106 before being placed into one of the substrate processing chambers 108 a-f, positioned in tandem sections 109 a-c. A second robotic arm 110 may be used to transport the substrate wafers from the holding area 106 to the substrate processing chambers 108 a-f and back. Each substrate processing chamber 108 a-f, can be outfitted to perform a number of substrate processing operations including the dry etch processes described herein in addition to cyclical layer deposition (CLD), atomic layer deposition (ALD), chemical vapor deposition (CVD), physical vapor deposition (PVD), etch, pre-clean, degas, orientation, and other substrate processes.

The substrate processing chambers 108 a-f may include one or more system components for depositing, annealing, curing and/or etching a dielectric film on the substrate wafer. In one configuration, two pairs of the processing chambers, e.g., 108 c-d and 108 e-f, may be used to deposit dielectric material on the substrate, and the third pair of processing chambers, e.g., 108 a-b, may be used to etch the deposited dielectric. In another configuration, all three pairs of chambers, e.g., 108 a-f, may be configured to etch a dielectric film on the substrate. Any one or more of the processes described may be carried out in chamber(s) separated from the fabrication system shown in different embodiments. It will be appreciated that additional configurations of deposition, etching, annealing, and curing chambers for dielectric films are contemplated by system 100.

FIG. 2A shows a cross-sectional view of an exemplary process chamber system 200 with partitioned plasma generation regions within the processing chamber. During film etching, e.g., titanium nitride, tantalum nitride, tungsten, silicon, polysilicon, silicon oxide, silicon nitride, silicon oxynitride, silicon oxycarbide, etc., a process gas may be flowed into the first plasma region 215 through a gas inlet assembly 205. A remote plasma system (RPS) 201 may optionally be included in the system, and may process a first gas which then travels through gas inlet assembly 205. The inlet assembly 205 may include two or more distinct gas supply channels where the second channel (not shown) may bypass the RPS 201, if included.

A cooling plate 203, faceplate 217, ion suppressor 223, showerhead 225, and a substrate support 265, having a substrate 255 disposed thereon, are shown and may each be included according to embodiments. The pedestal 265 may have a heat exchange channel through which a heat exchange fluid flows to control the temperature of the substrate, which may be operated to heat and/or cool the substrate or wafer during processing operations. The wafer support platter of the pedestal 265, which may comprise aluminum, ceramic, or a combination thereof, may also be resistively heated in order to achieve relatively high temperatures, such as from up to or about 100° C. to above or about 1100° C., using an embedded resistive heater element.

The faceplate 217 may be pyramidal, conical, or of another similar structure with a narrow top portion expanding to a wide bottom portion. The faceplate 217 may additionally be flat as shown and include a plurality of through-channels used to distribute process gases. Plasma generating gases and/or plasma excited species, depending on use of the RPS 201, may pass through a plurality of holes, shown in FIG. 2B, in faceplate 217 for a more uniform delivery into the first plasma region 215.

Exemplary configurations may include having the gas inlet assembly 205 open into a gas supply region 258 partitioned from the first plasma region 215 by faceplate 217 so that the gases/species flow through the holes in the faceplate 217 into the first plasma region 215. Structural and operational features may be selected to prevent significant backflow of plasma from the first plasma region 215 back into the supply region 258, gas inlet assembly 205, and fluid supply system 210. The faceplate 217, or a conductive top portion of the chamber, and showerhead 225 are shown with an insulating ring 220 located between the features, which allows an AC potential to be applied to the faceplate 217 relative to showerhead 225 and/or ion suppressor 223. The insulating ring 220 may be positioned between the faceplate 217 and the showerhead 225 and/or ion suppressor 223 enabling a capacitively coupled plasma (CCP) to be formed in the first plasma region. A baffle (not shown) may additionally be located in the first plasma region 215, or otherwise coupled with gas inlet assembly 205, to affect the flow of fluid into the region through gas inlet assembly 205.

The ion suppressor 223 may comprise a plate or other geometry that defines a plurality of apertures throughout the structure that are configured to suppress the migration of ionically-charged species out of the first plasma region 215 while allowing uncharged neutral or radical species to pass through the ion suppressor 223 into an activated gas delivery region between the suppressor and the showerhead. In embodiments, the ion suppressor 223 may comprise a perforated plate with a variety of aperture configurations. These uncharged species may include highly reactive species that are transported with less reactive carrier gas through the apertures. As noted above, the migration of ionic species through the holes may be reduced, and in some instances completely suppressed. Controlling the amount of ionic species passing through the ion suppressor 223 may advantageously provide increased control over the gas mixture brought into contact with the underlying wafer substrate, which in turn may increase control of the deposition and/or etch characteristics of the gas mixture. For example, adjustments in the ion concentration of the gas mixture can significantly alter its etch selectivity, e.g., SiNx:SiOx etch ratios, Si:SiOx etch ratios, etc. In alternative embodiments in which deposition is performed, it can also shift the balance of conformal-to-flowable style depositions for dielectric materials.

The plurality of apertures in the ion suppressor 223 may be configured to control the passage of the activated gas, i.e., the ionic, radical, and/or neutral species, through the ion suppressor 223. For example, the aspect ratio of the holes, or the hole diameter to length, and/or the geometry of the holes may be controlled so that the flow of ionically-charged species in the activated gas passing through the ion suppressor 223 is reduced. The holes in the ion suppressor 223 may include a tapered portion that faces the plasma excitation region 215, and a cylindrical portion that faces the showerhead 225. The cylindrical portion may be shaped and dimensioned to control the flow of ionic species passing to the showerhead 225. An adjustable electrical bias may also be applied to the ion suppressor 223 as an additional means to control the flow of ionic species through the suppressor.

The ion suppressor 223 may function to reduce or eliminate the amount of ionically charged species traveling from the plasma generation region to the substrate. Uncharged neutral and radical species may still pass through the openings in the ion suppressor to react with the substrate. It should be noted that the complete elimination of ionically charged species in the reaction region surrounding the substrate may not be performed in embodiments. In certain instances, ionic species are intended to reach the substrate in order to perform the etch and/or deposition process. In these instances, the ion suppressor may help to control the concentration of ionic species in the reaction region at a level that assists the process.

Showerhead 225 in combination with ion suppressor 223 may allow a plasma present in first plasma region 215 to avoid directly exciting gases in substrate processing region 233, while still allowing excited species to travel from chamber plasma region 215 into substrate processing region 233. In this way, the chamber may be configured to prevent the plasma from contacting a substrate 255 being etched. This may advantageously protect a variety of intricate structures and films patterned on the substrate, which may be damaged, dislocated, or otherwise warped if directly contacted by a generated plasma. Additionally, when plasma is allowed to contact the substrate or approach the substrate level, the rate at which oxide species etch may increase. Accordingly, if an exposed region of material is oxide, this material may be further protected by maintaining the plasma remotely from the substrate.

The processing system may further include a power supply 240 electrically coupled with the processing chamber to provide electric power to the faceplate 217, ion suppressor 223, showerhead 225, and/or pedestal 265 to generate a plasma in the first plasma region 215 or processing region 233. The power supply may be configured to deliver an adjustable amount of power to the chamber depending on the process performed. Such a configuration may allow for a tunable plasma to be used in the processes being performed. Unlike a remote plasma unit, which is often presented with on or off functionality, a tunable plasma may be configured to deliver a specific amount of power to the plasma region 215. This in turn may allow development of particular plasma characteristics such that precursors may be dissociated in specific ways to enhance the etching profiles produced by these precursors.

A plasma may be ignited either in chamber plasma region 215 above showerhead 225 or substrate processing region 233 below showerhead 225. In embodiments, the plasma formed in substrate processing region 233 may be a DC biased plasma formed with the pedestal acting as an electrode. Plasma may be present in chamber plasma region 215 to produce the radical precursors from an inflow of, for example, a fluorine-containing precursor or other precursor. An AC voltage typically in the radio frequency (RF) range may be applied between the conductive top portion of the processing chamber, such as faceplate 217, and showerhead 225 and/or ion suppressor 223 to ignite a plasma in chamber plasma region 215 during deposition. An RF power supply may generate a high RF frequency of 13.56 MHz but may also generate other frequencies alone or in combination with the 13.56 MHz frequency.

FIG. 2B shows a detailed view 253 of the features affecting the processing gas distribution through faceplate 217. As shown in FIGS. 2A and 2B, faceplate 217, cooling plate 203, and gas inlet assembly 205 intersect to define a gas supply region 258 into which process gases may be delivered from gas inlet 205. The gases may fill the gas supply region 258 and flow to first plasma region 215 through apertures 259 in faceplate 217. The apertures 259 may be configured to direct flow in a substantially unidirectional manner such that process gases may flow into processing region 233, but may be partially or fully prevented from backflow into the gas supply region 258 after traversing the faceplate 217.

The gas distribution assemblies such as showerhead 225 for use in the processing chamber section 200 may be referred to as dual channel showerheads (DCSH) and are additionally detailed in the embodiments described in FIG. 3. The dual channel showerhead may provide for etching processes that allow for separation of etchants outside of the processing region 233 to provide limited interaction with chamber components and each other prior to being delivered into the processing region.

The showerhead 225 may comprise an upper plate 214 and a lower plate 216. The plates may be coupled with one another to define a volume 218 between the plates. The coupling of the plates may be so as to provide first fluid channels 219 through the upper and lower plates, and second fluid channels 221 through the lower plate 216. The formed channels may be configured to provide fluid access from the volume 218 through the lower plate 216 via second fluid channels 221 alone, and the first fluid channels 219 may be fluidly isolated from the volume 218 between the plates and the second fluid channels 221. The volume 218 may be fluidly accessible through a side of the gas distribution assembly 225.

FIG. 3 is a bottom view of a showerhead 325 for use with a processing chamber according to embodiments. Showerhead 325 may correspond with the showerhead 225 shown in FIG. 2A. Through-holes 365, which show a view of first fluid channels 219, may have a plurality of shapes and configurations in order to control and affect the flow of precursors through the showerhead 225. Small holes 375, which show a view of second fluid channels 221, may be distributed substantially evenly over the surface of the showerhead, even amongst the through-holes 365, and may help to provide more even mixing of the precursors as they exit the showerhead than other configurations.

FIG. 4 shows a schematic cross-sectional view of an exemplary processing system 400 according to embodiments of the present technology. System 400 may include variations on the chamber illustrated in FIG. 2, and may include some or all of the components illustrated in that figure. System 400 may include a processing chamber 405 and a remote plasma unit 410. The remote plasma unit 410 may be coupled with processing chamber 405 with one or more components. The remote plasma unit 410 may be coupled with one or more of a remote plasma unit adapter 415, an isolator 420, a pressure plate 425, and inlet adapter 430, a diffuser 435, or a mixing manifold 440. Mixing manifold 440 may be coupled with a top of processing chamber 405, and may be coupled with an inlet to processing chamber 405.

Remote plasma unit adapter 415 may be coupled with remote plasma unit 410 at a first end 411, and may be coupled with isolator 420 at a second end 412 opposite first end 411. Through remote plasma unit adapter 415 may be defined one or more channels. At first end 411 may be defined an opening or port to a channel 413. Channel 413 may be centrally defined within remote plasma unit adapter 415, and may be characterized by a first cross-sectional surface area in a direction normal to a central axis through remote plasma unit adapter 415, which may be in the direction of flow from the remote plasma unit 410. A diameter of channel 413 may be equal to or in common with an exit port from remote plasma unit 410. Channel 413 may be characterized by a length from the first end 411 to the second end 412. Channel 413 may extend through the entire length of remote plasma unit adapter 415, or a length less than the length from first end 411 to second end 412. For example, channel 413 may extend less than halfway of the length from the first end 411 to the second end 412, channel 413 may extend halfway of the length from the first end 411 to the second end 412, channel 413 may extend more than halfway of the length from the first end 411 to the second end 412, or channel 413 may extend about halfway of the length from the first end 411 to the second end 412 of remote plasma unit adapter 415.

Remote plasma unit adapter 415 may also define one or more trenches 414 defined beneath remote plasma unit adapter 415. Trenches 414 may be or include one or more annular recesses defined within remote plasma unit adapter 415 to allow seating of an o-ring or elastomeric element, which may allow coupling with an isolator 420.

Isolator 420 may be coupled with second end 412 of remote plasma unit adapter 415 in embodiments. Isolator 420 may be or include an annular member about an isolator channel 421. Isolator channel 421 may be axially aligned with a central axis in the direction of flow through remote plasma unit adapter 415. Isolator channel 421 may be characterized by a second cross-sectional area in a direction normal to a direction of flow through isolator 420. The second cross-sectional area may be equal to, greater than, or less than the first cross-sectional area of channel 413. In embodiments, isolator channel 421 may be characterized by a diameter greater than, equal to, or about the same as a diameter of channel 413 through remote plasma unit adapter 415.

Isolator 420 may be made of a similar or different material from remote plasma unit adapter 415, mixing manifold 440, or any other chamber component. In some embodiments, while remote plasma unit adapter 415 and mixing manifold 440 may be made of or include aluminum, including oxides of aluminum, treated aluminum on one or more surfaces, or some other material, isolator 420 may be or include a material that is less thermally conductive than other chamber components. In some embodiments, isolator 420 may be or include a ceramic, plastic, or other thermally insulating component configured to provide a thermal break between the remote plasma unit 410 and the chamber 405. During operation, remote plasma unit 410 may be cooled or operate at a lower temperature relative to chamber 405, while chamber 405 may be heated or operate at a higher temperature relative to remote plasma unit 410. Providing a ceramic or thermally insulating isolator 420 may prevent or limit thermal, electrical, or other interference between the components.

Coupled with isolator 420 may be a pressure plate 425. Pressure plate 425 may be or include aluminum or another material in embodiments, and pressure plate 425 may be made of or include a similar or different material than remote plasma unit adapter 415 or mixing manifold 440 in embodiments. Pressure plate 425 may define a central aperture 423 through pressure plate 425. Central aperture 423 may be characterized by a tapered shape through pressure plate 425 from a portion proximate isolator channel 421 to the opposite side of pressure plate 425. A portion of central aperture 423 proximate isolator channel 421 may be characterized by a cross-sectional area normal a direction of flow equal to or similar to a cross-sectional area of isolator channel 421. Central aperture 423 may be characterized by a percentage of taper of greater than or about 10% across a length of pressure plate 425, and may be characterized by a percentage of taper greater than or about 20%, greater than or about 30%, greater than or about 40%, greater than or about 50%, greater than or about 60%, greater than or about 70%, greater than or about 80%, greater than or about 90%, greater than or about 100%, greater than or about 150%, greater than or about 200%, greater than or about 300%, or greater in embodiments. Pressure plate 425 may also define one or more trenches 424 defined beneath isolator 420. Trenches 424 may be or include one or more annular recesses defined within pressure plate 425 to allow seating of an o-ring or elastomeric element, which may allow coupling with isolator 420.

An inlet adapter 430 may be coupled with pressure plate 425 at a first end 426, and coupled with diffuser 435 at a second end 427 opposite first end 426. Inlet adapter 430 may define a central channel 428 defined through inlet adapter 430. Central channel 428 may be characterized by a first portion 429 a, and a second portion 429 b. First portion 429 a may extend from first end 426 to a first length through inlet adapter 430, wherein central channel 428 may transition to second portion 429 b, which may extend to second end 427. First portion 429 a may be characterized by a first cross-sectional area or diameter, and second portion 429 b may be characterized by a second cross-sectional area or diameter less than the first. In embodiments the cross-sectional area or diameter of first portion 429 a may be twice as large as the cross-sectional area or diameter of second portion 429 b, and may be up to or greater than about three times as large, greater than or about 4 times as large, greater than or about 5 times as large, greater than or about 6 times as large, greater than or about 7 times as large, greater than or about 8 times as large, greater than or about 9 times as large, greater than or about 10 times as large, or greater in embodiments. Central channel 428 may be configured to provide plasma effluents of a precursor delivered from remote plasma unit 410 in embodiments, which may pass through channel 413 of remote plasma unit adapter 415, isolator channel 421 of isolator 420, and central aperture 423 of pressure plate 425.

Inlet adapter 430 may also define one or more second channels 431, which may extend from below first portion 429 a to or through second end 427. The second channels 431 may be characterized by a second cross-sectional surface area in a direction normal to the central axis through inlet adapter 430. The second cross-sectional surface area may be less than the cross-sectional surface area of first portion 429 a in embodiments, and may be greater than the cross-sectional surface area or a diameter of second portion 429 b. Second channels 431 may extend to an exit from inlet adapter 430 at second end 427, and may provide egress from adapter 430 for a precursor, such as a first bypass precursor, delivered alternately from the remote plasma unit 410. For example, second channel 431 may be fluidly accessible from a first port 432 defined along an exterior surface, such as a side, of inlet adapter 430, which may bypass remote plasma unit 410. First port 432 may be at or below first portion 429 a along a length of inlet adapter 430, and may be configured to provide fluid access to the second channel 431.

Second channel 431 may deliver the precursor through the inlet adapter 430 and out second end 427. Second channel 431 may be defined in a region of inlet adapter 430 between first portion 429 a and second end 427. In embodiments, second channel 431 may not be accessible from central channel 428. Second channel 431 may be configured to maintain a precursor fluidly isolated from plasma effluents delivered into central channel 428 from remote plasma unit 410. The first bypass precursor may not contact plasma effluents until exiting inlet adapter 430 through second end 427. Second channel 431 may include one or more channels defined in adapter 430. Second channel 431 may be centrally located within adapter 430, and may be associated with central channels 428. For example, second channel 431 may be concentrically aligned and defined about central channel 428 in embodiments. Second channel 431 may be an annular or cylindrical channel extending partially through a length or vertical cross-section of inlet adapter 430 in embodiments. In some embodiments, second channel 431 may also be a plurality of channels extending radially about central channel 428.

Inlet adapter 430 may also define one or more third channels 433, which may extend from below first portion 429 a to or through second end 427, and may extend from below a plane bisecting first port 432. The third channels 433 may be characterized by a third cross-sectional surface area in a direction normal to the central axis through inlet adapter 430. The third cross-sectional surface area may be less than the cross-sectional surface area of first portion 429 a in embodiments, and may be greater than the cross-sectional surface area or a diameter of second portion 429 b. The third cross-sectional surface area may also be equal to or similar to the cross-sectional surface area or a diameter of first portion 429 a as illustrated. For example, an outer diameter of third channel 433 may be equivalent to an outer diameter of first portion 429 a, or may be less than an outer diameter of first portion 429 a. Third channels 433 may extend to an exit from inlet adapter 430 at second end 427, and may provide egress from adapter 430 for a precursor, such as a second bypass precursor, delivered alternately from the remote plasma unit 410. For example, third channel 433 may be fluidly accessible from a second port 434 defined along an exterior surface, such as a side, of inlet adapter 430, which may bypass remote plasma unit 410. Second port 434 may be located on an opposite side or portion of inlet adapter 430 as first port 432. Second port 434 may be at or below first portion 429 a along a length of inlet adapter 430, and may be configured to provide fluid access to the third channel 433. Second port 434 may also be at or below first port 432 along a length of inlet adapter 430 in embodiments.

Third channel 433 may deliver the second bypass precursor through the inlet adapter 430 and out second end 427. Third channel 433 may be defined in a region of inlet adapter 430 between first portion 429 a and second end 427. In embodiments, third channel 433 may not be accessible from central channel 428. Third channel 433 may be configured to maintain a second bypass precursor fluidly isolated from plasma effluents delivered into central channel 428 from remote plasma unit 410, and from a first bypass precursor delivered into second channel 431 through first port 432. The second bypass precursor may not contact plasma effluents or a first bypass precursor until exiting inlet adapter 430 through second end 427. Third channel 433 may include one or more channels defined in adapter 430. Third channel 433 may be centrally located within adapter 430, and may be associated with central channels 428 and second channel 431. For example, third channel 433 may be concentrically aligned and defined about central channel 428 in embodiments, and may be concentrically aligned and defined about second channel 431. Third channel 433 may be a second annular or cylindrical channel extending partially through a length or vertical cross-section of inlet adapter 430 in embodiments. In some embodiments, third channel 433 may also be a plurality of channels extending radially about central channel 428.

Diffuser 435 may be positioned between inlet adapter 430 and mixing manifold 440 to maintain precursors delivered through inlet adapter 430 fluidly isolated until accessing mixing manifold 440. Diffuser 435 may be characterized by one or more channels, such as cylindrical or annular channels defined through diffuser 435. In embodiments, diffuser 435 may define a first channel 436 or central channel, a second channel 437, and a third channel 438. The channels may be characterized by similar dimensions or diameters as second portion 429 b of central channel 428, second channel 431, and third channel 433 of inlet adapter 430. For example, each channel may extend the inlet adapter channels to mixing manifold 440. Second channel 437 and third channel 438 may each be annular channels defined about first channel 436, and first channel 436, second channel 437, and third channel 438 may be concentrically aligned in embodiments and defined through diffuser 435.

Diffuser 435 may additionally define one or more trenches 439 about diffuser 435. For example, diffuser 435 may define a first trench 439 a, a second trench 439 b, and a third trench 439 c in embodiments, which may allow seating of o-rings or elastomeric members between inlet adapter 430 and diffuser 435. Each of trenches 439 may be an annular trench in embodiments that sits radially exterior to one or more of the channels defined through diffuser 435. First trench 439 a may be located radially outward of first channel 436, and may be located between first channel 436 and second channel 437. Second trench 439 b may be located radially outward of second channel 437, and may be located between second channel 437 and third channel 438. Third trench 439 c may be located radially outward of third channel 438. A diameter of each trench 439 may be greater than the channel to which it may be associated and to which it may be located radially exterior. The trenches may enable improved sealing between the inlet adapter 430 and the diffuser 435 to ensure precursors are maintained fluidly isolated between the components, and leaking between the channels does not occur.

Mixing manifold 440 may be coupled with diffuser 435 at a first end 441, and may be coupled with chamber 405 at a second end 442. Mixing manifold 440 may define an inlet 443 at first end 441. Inlet 443 may provide fluid access from diffuser 435, and inlet 443 may be characterized by a diameter equal to or about the same as a diameter of third channel 438 through diffuser 435. Inlet 443 may define a portion of a channel 444 through mixing manifold 440, and the channel 444 may be composed of one or more sections defining a profile of channel 444. Inlet 443 may be a first section in the direction of flow through channel 444 of mixing manifold 440. Inlet 443 may be characterized by a length that may be less than half a length in the direction of flow of mixing manifold 440. The length of inlet 443 may also be less than a third of the length of mixing manifold 440, and may be less than one quarter the length of mixing manifold 440 in embodiments. Inlet 443 may receive each precursor from diffuser 435, and may allow for mixing of the precursors, which may have been maintained fluidly isolated until delivery to mixing manifold 440.

Inlet 443 may extend to a second section of channel 444, which may be or include a tapered section 445. Tapered section 445 may extend from a first diameter equal to or similar to a diameter of inlet 443 to a second diameter less than the first diameter. In some embodiments, the second diameter may be about or less than half the first diameter. Tapered section 445 may be characterized by a percentage of taper of greater than or about 10%, greater than or about 20%, greater than or about 30%, greater than or about 40%, greater than or about 50%, greater than or about 60%, greater than or about 70%, greater than or about 80%, greater than or about 90%, greater than or about 100%, greater than or about 150%, greater than or about 200%, greater than or about 300%, or greater in embodiments.

Tapered section 445 may transition to a third region of channel 444, which may be a flared section 446. Flared section 446 may extend from tapered section 445 to an outlet of mixing manifold 440 at second end 442. Flared section 446 may extend from a first diameter equal to the second diameter of tapered section 445 to a second diameter greater than the first diameter. In some embodiments, the second diameter may be about or greater than double the first diameter. Flared section 446 may be characterized by a percentage of flare of greater than or about 10%, greater than or about 20%, greater than or about 30%, greater than or about 40%, greater than or about 50%, greater than or about 60%, greater than or about 70%, greater than or about 80%, greater than or about 90%, greater than or about 100%, greater than or about 150%, greater than or about 200%, greater than or about 300%, or greater in embodiments.

Flared section 446 may provide egress to precursors delivered through mixing manifold 440 through second end 442 via an outlet 447. The sections of channel 444 through mixing manifold 440 may be configured to provide adequate or thorough mixing of precursors delivered to the mixing manifold, before providing the mixed precursors into chamber 405. Unlike conventional technology, by performing the etchant or precursor mixing prior to delivery to a chamber, the present systems may provide an etchant having uniform properties prior to being distributed about a chamber and substrate. In this way, processes performed with the present technology may have more uniform results across a substrate surface.

Chamber 405 may include a number of components in a stacked arrangement. The chamber stack may include a gasbox 450, a blocker plate 460, a faceplate 470, an ion suppression element 480, and a lid spacer 490. The components may be utilized to distribute a precursor or set of precursors through the chamber to provide a uniform delivery of etchants or other precursors to a substrate for processing. In embodiments, these components may be stacked plates each at least partially defining an exterior of chamber 405.

Gasbox 450 may define a chamber inlet 452. A central channel 454 may be defined through gasbox 450 to deliver precursors into chamber 405. Inlet 452 may be aligned with outlet 447 of mixing manifold 440. Inlet 452 and/or central channel 454 may be characterized by a similar diameter in embodiments. Central channel 454 may extend through gasbox 450 and be configured to deliver one or more precursors into a volume 457 defined from above by gasbox 450. Gasbox 450 may include a first surface 453, such as a top surface, and a second surface 455 opposite the first surface 453, such as a bottom surface of gasbox 450. Top surface 453 may be a planar or substantially planar surface in embodiments. Coupled with top surface 453 may be a heater 448.

Heater 448 may be configured to heat chamber 405 in embodiments, and may conductively heat each lid stack component. Heater 448 may be any kind of heater including a fluid heater, electrical heater, microwave heater, or other device configured to deliver heat conductively to chamber 405. In some embodiments, heater 448 may be or include an electrical heater formed in an annular pattern about first surface 453 of gasbox 450. The heater may be defined across the gasbox 450, and around mixing manifold 440. The heater may be a plate heater or resistive element heater that may be configured to provide up to, about, or greater than about 2,000 W of heat, and may be configured to provide greater than or about 2,500 W, greater than or about 3,000 W, greater than or about 3,500 W, greater than or about 4,000 W, greater than or about 4,500 W, greater than or about 5,000 W, or more.

Heater 448 may be configured to produce a variable chamber component temperature up to, about, or greater than about 50° C., and may be configured to produce a chamber component temperature greater than or about 75° C., greater than or about 100° C., greater than or about 150° C., greater than or about 200° C., greater than or about 250° C., greater than or about 300° C., or higher in embodiments. Heater 448 may be configured to raise individual components, such as the ion suppression element 480, to any of these temperatures to facilitate processing operations, such as an anneal. In some processing operations, a substrate may be raised toward the ion suppression element 480 for an annealing operation, and heater 448 may be adjusted to conductively raise the temperature of the heater to any particular temperature noted above, or within any range of temperatures within or between any of the stated temperatures.

Second surface 455 of gasbox 450 may be coupled with blocker plate 460. Blocker plate 460 may be characterized by a diameter equal to or similar to a diameter of gasbox 450. Blocker plate 460 may define a plurality of apertures 463 through blocker plate 460, only a sample of which are illustrated, which may allow distribution of precursors, such as etchants, from volume 457, and may begin distributing precursors through chamber 405 for a uniform delivery to a substrate. Although only a few apertures 463 are illustrated, it is to be understood that blocker plate 460 may have any number of apertures 463 defined through the structure. Blocker plate 460 may be characterized by a raised annular section 465 at an external diameter of the blocker plate 460, and a lowered annular section 466 at an external diameter of the blocker plate 460. Raised annular section 465 may provide structural rigidity for the blocker plate 460, and may define sides or an external diameter of volume 457 in embodiments. Blocker plate 460 may also define a bottom of volume 457 from below. Volume 457 may allow distribution of precursors from central channel 454 of gasbox 450 before passing through apertures 463 of blocker plate 460. Lowered annular section 466 may also provide structural rigidity for the blocker plate 460, and may define sides or an external diameter of a second volume 458 in embodiments. Blocker plate 460 may also define a top of volume 458 from above, while a bottom of volume 458 may be defined by faceplate 470 from below.

Faceplate 470 may include a first surface 472 and a second surface 474 opposite the first surface 472. Faceplate 470 may be coupled with blocker plate 460 at first surface 472, which may engage lowered annular section 466 of blocker plate 460. Faceplate 470 may define a ledge 473 at an interior of second surface 474, extending to third volume 475 at least partially defined within or by faceplate 470. For example, faceplate 470 may define sides or an external diameter of third volume 475 as well as a top of volume 475 from above, while ion suppression element 480 may define third volume 475 from below. Faceplate 470 may define a plurality of channels through the faceplate, such as previously described with chamber 200, although not illustrated in FIG. 4.

Ion suppression element 480 may be positioned proximate the second surface 474 of faceplate 470, and may be coupled with faceplate 470 at second surface 474. Ion suppression element 480 may be similar to ion suppressor 223 described above, and may be configured to reduce ionic migration into a processing region of chamber 405 housing a substrate. Ion suppression element 480 may define a plurality of apertures through the structure as illustrated in FIG. 2, although not illustrated in FIG. 4. In embodiments, gasbox 450, blocker plate 460, faceplate 470, and ion suppression element 480 may be coupled together, and in embodiments may be directly coupled together. By directly coupling the components, heat generated by heater 448 may be conducted through the components to maintain a particular chamber temperature that may be maintained with less variation between components. Ion suppression element 480 may also contact lid spacer 490, which together may at least partially define a plasma processing region in which a substrate is maintained during processing.

Turning to FIG. 5 is illustrated a bottom partial plan view of an inlet adapter 500 according to embodiments of the present technology. Inlet adapter 500 may be similar to inlet adapter 430 in embodiments. As illustrated, inlet adapter may include three channels concentrically aligned about a central axis of inlet adapter 500. It is to be understood that in other embodiments the inlet adapter 500 may include more or fewer channels than illustrated. Inlet adapter 500 may include a central channel 505 that may be fluidly accessible from a remote plasma unit as previously discussed. Central channel 505 may extend fully through inlet adapter 500. Second channel 510 may extend about central channel 505 and may provide fluid access for a first bypass precursor delivered additionally or alternatively with plasma effluents of a precursor through central channel 505. Second channel 510 may be accessed from first port 512 defined along an exterior of inlet adapter 500. Second channel 510 may be concentrically aligned with central channel 505, and may maintain a first bypass precursor fluidly isolated from plasma effluents or a different precursor flowing through central channel 505.

Third channel 515 may extend about central channel 505 and second channel 510, and may provide fluid access for a second bypass precursor delivered additionally or alternatively with plasma effluents of a precursor through central channel 505 and a first bypass precursor through second channel 510. Third channel 515 may be accessed from a second port 517 defined along an exterior of inlet adapter 500, which may be located on a side of inlet adapter 500 opposite first port 512. Second port 517 as well as third channel 515 may be located below a horizontal plane through first port 512. Third channel 515 may be concentrically aligned with central channel 505, and may maintain a second bypass precursor fluidly isolated from plasma effluents or a different precursor flowing through central channel 505, and a first bypass precursor delivered through second channel 510.

Both second channel 510 and third channel 515 may be annular channel defined at least partially through a length of inlet adapter 500 in embodiments. The channels may also be a plurality of channels defined radially about central channel 505. By providing three separate pathways for precursors, different volumes and/or flow rates of precursors may be utilized providing greater control over precursor delivery and etchant generation. Each precursor may be delivered with one or more carrier gases, and etchant developed may be finely tuned prior to delivery into a processing chamber fluidly coupled with inlet adapter 500.

FIG. 6 shows operations of a method 600 of delivering precursors through a processing chamber according to embodiments of the present technology. Method 600 may be performed in chamber 200 or chamber 405, and may allow improved precursor mixing externally to the chamber, while protecting components from etchant damage. While components of a chamber may be exposed to etchants that may cause wear over time, the present technology may limit these components to those that may be more easily replaced and serviced. For example, the present technology may limit exposure of internal components of a remote plasma unit, which may allow particular protection to be applied to the remote plasma unit.

Method 600 may include forming a remote plasma of a fluorine-containing precursor in operation 605. The precursor may be delivered to a remote plasma unit to be dissociated to produce plasma effluents. In embodiments, the remote plasma unit may be coated or lined with an oxide or other material that may withstand contact with the fluorine-containing effluents. In embodiments, aside from carrier gases, no other etchant precursors may be delivered through the remote plasma unit, which may protect the unit from damage. Other embodiments configured to produce plasma effluents of a different etchant may be lined with a different material that may be inert to that precursor or a combination of precursors.

At operation 610, plasma effluents of the fluorine-containing precursor may be flowed into an adapter coupled with the remote plasma unit. At operation 615, a hydrogen-containing precursor may be flowed into the adapter. The adapter may be configured to maintain the plasma effluents of the fluorine-containing precursor and the hydrogen-containing precursor fluidly isolated through the adapter. At operation 620, a third precursor may be flowed into the adapter. The third precursor may include an additional hydrogen-containing precursor, an additional halogen-containing precursor, or other combinations of precursors. The adapter may be configured to maintain the plasma effluents of the fluorine-containing precursor, the hydrogen-containing precursor, and the third precursor fluidly isolated through the adapter.

At operation 625, the plasma effluents of the fluorine-containing precursor and the hydrogen-containing precursor may be flowed into a mixing manifold configured to mix the plasma effluents of the fluorine-containing precursor, the hydrogen-containing precursor, and the third precursor prior to delivering the mixed precursors or etchant produced into a semiconductor processing chamber. Additional components described elsewhere may be used to control delivery and distribution of the etchants as previously discussed. It is to be understood that the precursors identified are only examples of suitable precursors for use in the described chambers. The chambers and materials discussed throughout the disclosure may be used in any number of other processing operations that may benefit from separating precursors and mixing them prior to delivery into a processing chamber.

In the preceding description, for the purposes of explanation, numerous details have been set forth in order to provide an understanding of various embodiments of the present technology. It will be apparent to one skilled in the art, however, that certain embodiments may be practiced without some of these details, or with additional details.

Having disclosed several embodiments, it will be recognized by those of skill in the art that various modifications, alternative constructions, and equivalents may be used without departing from the spirit of the embodiments. Additionally, a number of well-known processes and elements have not been described in order to avoid unnecessarily obscuring the present technology. Accordingly, the above description should not be taken as limiting the scope of the technology.

Where a range of values is provided, it is understood that each intervening value, to the smallest fraction of the unit of the lower limit, unless the context clearly dictates otherwise, between the upper and lower limits of that range is also specifically disclosed. Any narrower range between any stated values or unstated intervening values in a stated range and any other stated or intervening value in that stated range is encompassed. The upper and lower limits of those smaller ranges may independently be included or excluded in the range, and each range where either, neither, or both limits are included in the smaller ranges is also encompassed within the technology, subject to any specifically excluded limit in the stated range. Where the stated range includes one or both of the limits, ranges excluding either or both of those included limits are also included.

As used herein and in the appended claims, the singular forms “a”, “an”, and “the” include plural references unless the context clearly dictates otherwise. Thus, for example, reference to “a layer” includes a plurality of such layers, and reference to “the precursor” includes reference to one or more precursors and equivalents thereof known to those skilled in the art, and so forth.

Also, the words “comprise(s)”, “comprising”, “contain(s)”, “containing”, “include(s)”, and “including”, when used in this specification and in the following claims, are intended to specify the presence of stated features, integers, components, or operations, but they do not preclude the presence or addition of one or more other features, integers, components, operations, acts, or groups. 

1. A semiconductor processing system comprising: a processing chamber; a remote plasma unit coupled with the processing chamber; and an adapter coupled with the remote plasma unit, wherein the adapter comprises a first end and a second end opposite the first end, wherein the adapter defines a central channel through the adapter, wherein the adapter defines an exit from a second channel at the second end, wherein the adapter defines an exit from a third channel at the second end of the adapter, and wherein the central channel, the second channel, and the third channel are each fluidly isolated from one another within the adapter.
 2. The semiconductor processing system of claim 1, wherein the second channel comprises a first annular channel extending at least partially through a vertical cross-section of the adapter, and wherein the second channel is defined about the central channel.
 3. The semiconductor processing system of claim 2, wherein the adapter further defines a first port located at an exterior of the adapter, and configured to provide fluid access to the second channel.
 4. The semiconductor processing system of claim 2, wherein the third channel comprises a second annular channel extending at least partially through a vertical cross-section of the adapter, and wherein the third channel is defined about the second channel.
 5. The semiconductor processing system of claim 4, wherein the adapter further defines a second port located at an exterior of the adapter, and configured to provide fluid access to the third channel.
 6. The semiconductor processing system of claim 4, wherein the central channel, the second channel, and the third channel are concentrically aligned.
 7. The semiconductor processing system of claim 1, further comprising an isolator coupled between the adapter and the remote plasma unit.
 8. The semiconductor processing system of claim 7, wherein the isolator comprises a ceramic.
 9. The semiconductor processing system of claim 1, further comprising a mixing manifold coupled between the adapter and the processing chamber.
 10. The semiconductor processing system of claim 9, wherein the mixing manifold is characterized by an inlet having a diameter greater than or equal to an external diameter of the third channel.
 11. The semiconductor processing system of claim 10, wherein the inlet of the mixing manifold transitions to a tapered section of the mixing manifold.
 12. The semiconductor processing system of claim 11, wherein the tapered section of the mixing manifold transitions to a flared section of the mixing manifold extending to an outlet of the mixing manifold.
 13. A semiconductor processing system comprising: a remote plasma unit; and a processing chamber comprising: a gasbox defining a central channel, a blocker plate coupled with the gasbox, wherein the blocker plate defines a plurality of apertures through the blocker plate, a faceplate coupled with the blocker plate at a first surface of the faceplate, an ion suppression element coupled with the faceplate at a second surface of the faceplate opposite the first surface of the faceplate.
 14. The semiconductor processing system of claim 13, further comprising a heater coupled externally to the gasbox about a mixing manifold coupled to the gasbox.
 15. The semiconductor processing system of claim 13, wherein the gasbox defines a first volume from above and the blocker plate defines the first volume along an external diameter of the first volume and from below, and wherein the faceplate defines a second volume from above and along an external diameter of the second volume, and wherein the ion suppression element defines the second volume from below.
 16. The semiconductor processing system of claim 13, wherein the gasbox, blocker plate, faceplate, and ion suppression element are directly coupled together.
 17. The semiconductor processing system of claim 13, further comprising an adapter coupled with the remote plasma unit, wherein the adapter comprises a first end and a second end opposite the first end, wherein the adapter defines a central channel through the adapter, wherein the adapter defines an exit from a second channel at the second end, wherein the adapter defines an exit from a third channel at the second end of the adapter, and wherein the central channel, the second channel, and the third channel are each fluidly isolated from one another within the adapter.
 18. The semiconductor processing system of claim 13, wherein the ion suppression element is configured to limit or reduce ionic species delivered to a processing region of the processing chamber.
 19. A method of delivering precursors through a semiconductor processing system, the method comprising: forming a plasma of a fluorine-containing precursor in a remote plasma unit; flowing plasma effluents of the fluorine-containing precursor into an adapter; flowing a hydrogen-containing precursor into the adapter; flowing a third precursor into the adapter, wherein the adapter is configured to maintain the plasma effluents of the fluorine-containing precursor, the hydrogen-containing precursor, and the third precursor fluidly isolated through the adapter; and flowing the plasma effluents of the fluorine-containing precursor and the hydrogen-containing precursor into a mixing manifold configured to mix the plasma effluents of the fluorine-containing precursor and the hydrogen-containing precursor.
 20. The method of delivering precursors through a semiconductor processing system of claim 19, further comprising flowing the mixed plasma effluents of the fluorine-containing precursor, the hydrogen-containing precursor, and the third precursor into a processing chamber. 